Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond.
Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate
72nd ECTC Final Program by ECTC - Issuu
Reactive Ion Etching Tool and Wafer Etching – Cleanroom Research Laboratory
Semiconductor Manufacturing Equipment : Hitachi High-Tech Corporation
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Etch Tactras™ Series, Products and Service(products)
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Plasma wafer etching machine - 9000 series - Hitachi High-Tech Europe GmbH - for the microelectronics industry
Preparation of Polymer-Immobilized Polyimide Films Using Hot Pressing and Titania Coatings
Semiconductor Industry Tutorial
Semiconductor Industry Tutorial
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Micromachines, Free Full-Text
Hitachi High-Technologies Develops Enhanced Microwave ECR Etching Module